JPS633302B2 - - Google Patents

Info

Publication number
JPS633302B2
JPS633302B2 JP19457983A JP19457983A JPS633302B2 JP S633302 B2 JPS633302 B2 JP S633302B2 JP 19457983 A JP19457983 A JP 19457983A JP 19457983 A JP19457983 A JP 19457983A JP S633302 B2 JPS633302 B2 JP S633302B2
Authority
JP
Japan
Prior art keywords
protective film
mask
pattern
photomask
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19457983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6086545A (ja
Inventor
Setsuo Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58194579A priority Critical patent/JPS6086545A/ja
Publication of JPS6086545A publication Critical patent/JPS6086545A/ja
Publication of JPS633302B2 publication Critical patent/JPS633302B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58194579A 1983-10-17 1983-10-17 マスク保護膜 Granted JPS6086545A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58194579A JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58194579A JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Publications (2)

Publication Number Publication Date
JPS6086545A JPS6086545A (ja) 1985-05-16
JPS633302B2 true JPS633302B2 (en]) 1988-01-22

Family

ID=16326886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58194579A Granted JPS6086545A (ja) 1983-10-17 1983-10-17 マスク保護膜

Country Status (1)

Country Link
JP (1) JPS6086545A (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421303U (en]) * 1990-06-14 1992-02-24
US10388427B2 (en) 2016-09-20 2019-08-20 Furukawa Electric Co., Ltd. Flat cable, method for manufacturing the same, and rotatable connector device including the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139547A (ja) * 1985-12-13 1987-06-23 Daicel Chem Ind Ltd 帯電防止性を有する感光積層体
JPS6446738A (en) * 1987-08-17 1989-02-21 Fuaintetsuku Kenkyusho Kk Antistatic photosensitive laminated film
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
US5079113A (en) * 1988-09-29 1992-01-07 Sharp Kabushiki Kaisha Photo-mask
JP2558304B2 (ja) * 1987-12-28 1996-11-27 大日本印刷株式会社 製版用ガラスパターン
US5178976A (en) * 1990-09-10 1993-01-12 General Electric Company Technique for preparing a photo-mask for imaging three-dimensional objects
GB2301050B (en) * 1995-05-12 1999-06-23 Kimoto Company Limited Masking films
JP4197378B2 (ja) * 1999-08-18 2008-12-17 大日本印刷株式会社 ハーフトーン位相シフトフォトマスク及びそのためのハーフトーン位相シフトフォトマスク用ブランクス並びにこれを用いたパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421303U (en]) * 1990-06-14 1992-02-24
US10388427B2 (en) 2016-09-20 2019-08-20 Furukawa Electric Co., Ltd. Flat cable, method for manufacturing the same, and rotatable connector device including the same

Also Published As

Publication number Publication date
JPS6086545A (ja) 1985-05-16

Similar Documents

Publication Publication Date Title
TWI270746B (en) Anti-ESD photomask blank
US5989754A (en) Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
US4600686A (en) Method of forming a resist mask resistant to plasma etching
US5079113A (en) Photo-mask
US4537813A (en) Photomask encapsulation
JPS633302B2 (en])
US6153361A (en) Method of removing photoresist at the edge of wafers
US6803156B2 (en) Electrostatic damage (ESD) protected photomask
US4556608A (en) Photomask blank and photomask
JP3342693B2 (ja) Ｅｓｄ保護機能を有するフォトマスク
JPS5851412B2 (ja) 半導体装置の微細加工方法
US6569576B1 (en) Reticle cover for preventing ESD damage
EP0049799B1 (en) Photomask blank and photomask
US6893780B1 (en) Photomask and method for reducing electrostatic discharge on the same with an ESD protection pattern
JP2863131B2 (ja) フォトマスクブランクスの製造方法
JPH05100410A (ja) レチクル
JP2003121989A (ja) ハーフトーン型位相シフトマスクの修正方法
US7029800B2 (en) Reticle with antistatic coating
JP2015180962A (ja) 静電気放電保護構造を有するフォトリソグラフィレクチル
EP0310412B1 (en) Improvements in photo-masks
JPH03157653A (ja) レチクル
JP2500526B2 (ja) フォトマスクブランクおよびフォトマスク
JPS6159506B2 (en])
JPS6340305B2 (en])
KR200208744Y1 (ko) 펠리클이 필요 없는 레티클